DOI

We propose a method for obtaining TiN coatings by reactive anodic evaporation of titanium using a high-current (30 A) discharge with a self-heated hollow cathode in an Ar + N2 gas mixture. The optical spectral analysis shows that the gas-discharge plasma contains a large amount of activated titanium, while the fraction of singly charged metal ions supplied from the plasma to substrate reaches up to 70%. Titanium coatings with 2-μm thickness and up to 24-GPa hardness were obtained at a nitrogen flow rate of 5 cm3/min. The rate of TiN deposition at a distance of 7 cm from the vapor source amounted to ~4 μm/h.
Язык оригиналаАнглийский
Страницы (с-по)511-514
Число страниц4
ЖурналTechnical Physics Letters
Том47
Номер выпуска7
DOI
СостояниеОпубликовано - июл. 2021

    Предметные области WoS

  • Физика, Прикладная

    Предметные области ASJC Scopus

  • Physics and Astronomy (miscellaneous)

    ГРНТИ

  • 29.00.00 ФИЗИКА

    Уровень публикации

  • Перечень ВАК

ID: 29481568