Obtaining TiN Coatings by Reactive Anodic Evaporation of Titanium in a Gas Discharge with a Self-Heated Hollow Cathode

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Obtaining TiN Coatings by Reactive Anodic Evaporation of Titanium in a Gas Discharge with a Self-Heated Hollow Cathode. / Men’shakov, A. I.; Emlin, D. R.
в: Technical Physics Letters, Том 47, № 7, 07.2021, стр. 511-514.

Результаты исследований: Вклад в журнал › Статья › Рецензирование

BibTeX

@article{70567e26e2f7450a8417de6477d62058,

title = "Obtaining TiN Coatings by Reactive Anodic Evaporation of Titanium in a Gas Discharge with a Self-Heated Hollow Cathode",

abstract = "We propose a method for obtaining TiN coatings by reactive anodic evaporation of titanium using a high-current (30 A) discharge with a self-heated hollow cathode in an Ar + N2 gas mixture. The optical spectral analysis shows that the gas-discharge plasma contains a large amount of activated titanium, while the fraction of singly charged metal ions supplied from the plasma to substrate reaches up to 70%. Titanium coatings with 2-μm thickness and up to 24-GPa hardness were obtained at a nitrogen flow rate of 5 cm3/min. The rate of TiN deposition at a distance of 7 cm from the vapor source amounted to ~4 μm/h.",

keywords = "PVD, anodic evaporation, self-heated hollow cathode, titanium nitride, PLASMA, DEPOSITION",

author = "Men{\textquoteright}shakov, {A. I.} and Emlin, {D. R.}",

note = "This work was supported by the Russian Science Foundation, project no. 20-79-10059. ",

year = "2021",

month = jul,

doi = "10.1134/S1063785021050254",

language = "English",

volume = "47",

pages = "511--514",

journal = "Technical Physics Letters",

issn = "1063-7850",

publisher = "Maik Nauka-Interperiodica Publishing",

number = "7",

}

RIS

TY - JOUR

T1 - Obtaining TiN Coatings by Reactive Anodic Evaporation of Titanium in a Gas Discharge with a Self-Heated Hollow Cathode

AU - Men’shakov, A. I.

AU - Emlin, D. R.

N1 - This work was supported by the Russian Science Foundation, project no. 20-79-10059.

PY - 2021/7

Y1 - 2021/7

N2 - We propose a method for obtaining TiN coatings by reactive anodic evaporation of titanium using a high-current (30 A) discharge with a self-heated hollow cathode in an Ar + N2 gas mixture. The optical spectral analysis shows that the gas-discharge plasma contains a large amount of activated titanium, while the fraction of singly charged metal ions supplied from the plasma to substrate reaches up to 70%. Titanium coatings with 2-μm thickness and up to 24-GPa hardness were obtained at a nitrogen flow rate of 5 cm3/min. The rate of TiN deposition at a distance of 7 cm from the vapor source amounted to ~4 μm/h.

AB - We propose a method for obtaining TiN coatings by reactive anodic evaporation of titanium using a high-current (30 A) discharge with a self-heated hollow cathode in an Ar + N2 gas mixture. The optical spectral analysis shows that the gas-discharge plasma contains a large amount of activated titanium, while the fraction of singly charged metal ions supplied from the plasma to substrate reaches up to 70%. Titanium coatings with 2-μm thickness and up to 24-GPa hardness were obtained at a nitrogen flow rate of 5 cm3/min. The rate of TiN deposition at a distance of 7 cm from the vapor source amounted to ~4 μm/h.

KW - PVD

KW - anodic evaporation

KW - self-heated hollow cathode

KW - titanium nitride

KW - PLASMA

KW - DEPOSITION

UR - https://www.elibrary.ru/item.asp?id=47543735

UR - http://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=85121335252

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000776813000007

U2 - 10.1134/S1063785021050254

DO - 10.1134/S1063785021050254

M3 - Article

VL - 47

SP - 511

EP - 514

JO - Technical Physics Letters

JF - Technical Physics Letters

SN - 1063-7850

IS - 7

ER -

ID: 29481568