Standard

High-rate low-temperature PVD of thick 10 μm α-alumina coatings. / Gavrilov, N. V.; Kamenetskikh, A. S.; Tretnikov, P. V. и др.
в: Journal of Physics: Conference Series, Том 1393, № 1, 012082, 28.11.2019.

Результаты исследований: Вклад в журнал › Материалы конференции › Рецензирование

Harvard

Gavrilov, NV, Kamenetskikh, AS, Tretnikov, PV & Chukin, AV 2019, 'High-rate low-temperature PVD of thick 10 μm α-alumina coatings', Journal of Physics: Conference Series, Том. 1393, № 1, 012082. https://doi.org/10.1088/1742-6596/1393/1/012082

APA

Gavrilov, N. V., Kamenetskikh, A. S., Tretnikov, P. V., & Chukin, A. V. (2019). High-rate low-temperature PVD of thick 10 μm α-alumina coatings. Journal of Physics: Conference Series, 1393(1), [012082]. https://doi.org/10.1088/1742-6596/1393/1/012082

Vancouver

Gavrilov NV, Kamenetskikh AS, Tretnikov PV, Chukin AV. High-rate low-temperature PVD of thick 10 μm α-alumina coatings. Journal of Physics: Conference Series. 2019 нояб. 28;1393(1):012082. doi: 10.1088/1742-6596/1393/1/012082

Author

Gavrilov, N. V. ; Kamenetskikh, A. S. ; Tretnikov, P. V. и др. / High-rate low-temperature PVD of thick 10 μm α-alumina coatings. в: Journal of Physics: Conference Series. 2019 ; Том 1393, № 1.

BibTeX

@article{e47254036a2b41f8a8d69103243f5017,
title = "High-rate low-temperature PVD of thick 10 μm α-alumina coatings",
keywords = "GRAIN-GROWTH, FILMS, ALPHA-AL2O3, DEPOSITION, ARC, EVAPORATION",
author = "Gavrilov, {N. V.} and Kamenetskikh, {A. S.} and Tretnikov, {P. V.} and Chukin, {A. V.}",
year = "2019",
month = nov,
day = "28",
doi = "10.1088/1742-6596/1393/1/012082",
language = "English",
volume = "1393",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "Institute of Physics Publishing",
number = "1",
note = "14th International Conference on Gas Discharge Plasmas and Their Applications, GDP 2019 ; Conference date: 15-09-2019 Through 21-09-2019",

}

RIS

TY - JOUR

T1 - High-rate low-temperature PVD of thick 10 μm α-alumina coatings

AU - Gavrilov, N. V.

AU - Kamenetskikh, A. S.

AU - Tretnikov, P. V.

AU - Chukin, A. V.

PY - 2019/11/28

Y1 - 2019/11/28

KW - GRAIN-GROWTH

KW - FILMS

KW - ALPHA-AL2O3

KW - DEPOSITION

KW - ARC

KW - EVAPORATION

UR - http://www.scopus.com/inward/record.url?scp=85077965962&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000542026500081

U2 - 10.1088/1742-6596/1393/1/012082

DO - 10.1088/1742-6596/1393/1/012082

M3 - Conference article

AN - SCOPUS:85077965962

VL - 1393

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012082

T2 - 14th International Conference on Gas Discharge Plasmas and Their Applications, GDP 2019

Y2 - 15 September 2019 through 21 September 2019

ER -

ID: 11898892