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Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt. / Isakov, Andrey; Khvostov, Sergey; Kinev, Evgeny и др.
в: Journal of the Electrochemical Society, Том 167, № 8, 082515, 25.05.2020.

Результаты исследований: Вклад в журнал › Статья › Рецензирование

Harvard

Isakov, A, Khvostov, S, Kinev, E, Laptev, M, Khudorozhkova, A, Grishenkova, O, Rychkov, V & Zaikov, Y 2020, 'Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt', Journal of the Electrochemical Society, Том. 167, № 8, 082515. https://doi.org/10.1149/1945-7111/ab933c

APA

Isakov, A., Khvostov, S., Kinev, E., Laptev, M., Khudorozhkova, A., Grishenkova, O., Rychkov, V., & Zaikov, Y. (2020). Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt. Journal of the Electrochemical Society, 167(8), [082515]. https://doi.org/10.1149/1945-7111/ab933c

Vancouver

Isakov A, Khvostov S, Kinev E, Laptev M, Khudorozhkova A, Grishenkova O и др. Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt. Journal of the Electrochemical Society. 2020 май 25;167(8):082515. doi: 10.1149/1945-7111/ab933c

Author

Isakov, Andrey ; Khvostov, Sergey ; Kinev, Evgeny и др. / Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt. в: Journal of the Electrochemical Society. 2020 ; Том 167, № 8.

BibTeX

@article{d428daa4b4fa4c51b545a6cb48fb6b27,
title = "Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt",
keywords = "Electrodeposition, Films, Neutron transmutation doping, Silicon, Surface modification",
author = "Andrey Isakov and Sergey Khvostov and Evgeny Kinev and Michael Laptev and Anastasia Khudorozhkova and Olga Grishenkova and Vladimir Rychkov and Yurii Zaikov",
year = "2020",
month = may,
day = "25",
doi = "10.1149/1945-7111/ab933c",
language = "English",
volume = "167",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "8",

}

RIS

TY - JOUR

T1 - Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt

AU - Isakov, Andrey

AU - Khvostov, Sergey

AU - Kinev, Evgeny

AU - Laptev, Michael

AU - Khudorozhkova, Anastasia

AU - Grishenkova, Olga

AU - Rychkov, Vladimir

AU - Zaikov, Yurii

PY - 2020/5/25

Y1 - 2020/5/25

KW - Electrodeposition

KW - Films

KW - Neutron transmutation doping

KW - Silicon

KW - Surface modification

UR - http://www.scopus.com/inward/record.url?scp=85086020276&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000537494600001

U2 - 10.1149/1945-7111/ab933c

DO - 10.1149/1945-7111/ab933c

M3 - Article

AN - SCOPUS:85086020276

VL - 167

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 8

M1 - 082515

ER -

ID: 13162102