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Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies. / Kamenetskih, A. S.; Kukharenko, A. I.; Kurmaev, E. Z. и др.
в: Surface and Coatings Technology, Том 278, 01.01.2015, стр. 87-91.

Результаты исследований: Вклад в журнал › Статья › Рецензирование

Harvard

Kamenetskih, AS, Kukharenko, AI, Kurmaev, EZ, Skorikov, NA, Gavrilov, NV, Cholakh, SO, Chukin, AV, Zainullina, VM & Korotin, MA 2015, 'Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies', Surface and Coatings Technology, Том. 278, стр. 87-91. https://doi.org/10.1016/j.surfcoat.2015.08.007

APA

Kamenetskih, A. S., Kukharenko, A. I., Kurmaev, E. Z., Skorikov, N. A., Gavrilov, N. V., Cholakh, S. O., Chukin, A. V., Zainullina, V. M., & Korotin, M. A. (2015). Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies. Surface and Coatings Technology, 278, 87-91. https://doi.org/10.1016/j.surfcoat.2015.08.007

Vancouver

Kamenetskih AS, Kukharenko AI, Kurmaev EZ, Skorikov NA, Gavrilov NV, Cholakh SO и др. Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies. Surface and Coatings Technology. 2015 янв. 1;278:87-91. doi: 10.1016/j.surfcoat.2015.08.007

Author

Kamenetskih, A. S. ; Kukharenko, A. I. ; Kurmaev, E. Z. и др. / Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies. в: Surface and Coatings Technology. 2015 ; Том 278. стр. 87-91.

BibTeX

@article{4604c2cc3883462ea1d34f5c3c2b2d34,
title = "Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies",
keywords = "TiAlON coatings, Magnetron sputtering, X-ray photoelectron spectra, Density functional theory, Electronic structure, MECHANICAL-PROPERTIES, ION-BOMBARDMENT, SILICON-NITRIDE, THIN-FILMS, TIN FILMS, SI, MICROSTRUCTURE, RESISTANCE",
author = "Kamenetskih, {A. S.} and Kukharenko, {A. I.} and Kurmaev, {E. Z.} and Skorikov, {N. A.} and Gavrilov, {N. V.} and Cholakh, {S. O.} and Chukin, {A. V.} and Zainullina, {V. M.} and Korotin, {M. A.}",
year = "2015",
month = jan,
day = "1",
doi = "10.1016/j.surfcoat.2015.08.007",
language = "English",
volume = "278",
pages = "87--91",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier BV",

}

RIS

TY - JOUR

T1 - Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies

AU - Kamenetskih, A. S.

AU - Kukharenko, A. I.

AU - Kurmaev, E. Z.

AU - Skorikov, N. A.

AU - Gavrilov, N. V.

AU - Cholakh, S. O.

AU - Chukin, A. V.

AU - Zainullina, V. M.

AU - Korotin, M. A.

PY - 2015/1/1

Y1 - 2015/1/1

KW - TiAlON coatings

KW - Magnetron sputtering

KW - X-ray photoelectron spectra

KW - Density functional theory

KW - Electronic structure

KW - MECHANICAL-PROPERTIES

KW - ION-BOMBARDMENT

KW - SILICON-NITRIDE

KW - THIN-FILMS

KW - TIN FILMS

KW - SI

KW - MICROSTRUCTURE

KW - RESISTANCE

UR - http://www.scopus.com/inward/record.url?scp=84941670773&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000361934800012

U2 - 10.1016/j.surfcoat.2015.08.007

DO - 10.1016/j.surfcoat.2015.08.007

M3 - Article

AN - SCOPUS:84941670773

VL - 278

SP - 87

EP - 91

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -

ID: 289406