Standard

Structural defects induced by Fe-ion implantation in TiO2. / Leedahl, B.; Zatsepin, D. A.; Boukhvalov, D. W. и др.
в: Journal of Applied Physics, Том 115, № 5, 053711, 07.02.2014.

Результаты исследований: Вклад в журнал › Статья › Рецензирование

Harvard

Leedahl, B, Zatsepin, DA, Boukhvalov, DW, Green, RJ, McLeod, JA, Kim, SS, Kurmaev, EZ, Zhidkov, IS, Gavrilov, NV, Cholakh, SO & Moewes, A 2014, 'Structural defects induced by Fe-ion implantation in TiO2', Journal of Applied Physics, Том. 115, № 5, 053711. https://doi.org/10.1063/1.4864748

APA

Leedahl, B., Zatsepin, D. A., Boukhvalov, D. W., Green, R. J., McLeod, J. A., Kim, S. S., Kurmaev, E. Z., Zhidkov, I. S., Gavrilov, N. V., Cholakh, S. O., & Moewes, A. (2014). Structural defects induced by Fe-ion implantation in TiO2. Journal of Applied Physics, 115(5), [053711]. https://doi.org/10.1063/1.4864748

Vancouver

Leedahl B, Zatsepin DA, Boukhvalov DW, Green RJ, McLeod JA, Kim SS и др. Structural defects induced by Fe-ion implantation in TiO2. Journal of Applied Physics. 2014 февр. 7;115(5):053711. doi: 10.1063/1.4864748

Author

Leedahl, B. ; Zatsepin, D. A. ; Boukhvalov, D. W. и др. / Structural defects induced by Fe-ion implantation in TiO2. в: Journal of Applied Physics. 2014 ; Том 115, № 5.

BibTeX

@article{9747755289a1406580557e3ba3eaac52,
title = "Structural defects induced by Fe-ion implantation in TiO2",
keywords = "X-RAY-ABSORPTION, LIGHT-SOURCE, THIN-FILMS, PHOTOCATALYSIS, SPECTROSCOPY, SEMICONDUCTORS, EMISSION, BEAMLINE, OXIDES",
author = "B. Leedahl and Zatsepin, {D. A.} and Boukhvalov, {D. W.} and Green, {R. J.} and McLeod, {J. A.} and Kim, {S. S.} and Kurmaev, {E. Z.} and Zhidkov, {I. S.} and Gavrilov, {N. V.} and Cholakh, {S. O.} and A. Moewes",
year = "2014",
month = feb,
day = "7",
doi = "10.1063/1.4864748",
language = "English",
volume = "115",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "5",

}

RIS

TY - JOUR

T1 - Structural defects induced by Fe-ion implantation in TiO2

AU - Leedahl, B.

AU - Zatsepin, D. A.

AU - Boukhvalov, D. W.

AU - Green, R. J.

AU - McLeod, J. A.

AU - Kim, S. S.

AU - Kurmaev, E. Z.

AU - Zhidkov, I. S.

AU - Gavrilov, N. V.

AU - Cholakh, S. O.

AU - Moewes, A.

PY - 2014/2/7

Y1 - 2014/2/7

KW - X-RAY-ABSORPTION

KW - LIGHT-SOURCE

KW - THIN-FILMS

KW - PHOTOCATALYSIS

KW - SPECTROSCOPY

KW - SEMICONDUCTORS

KW - EMISSION

KW - BEAMLINE

KW - OXIDES

UR - http://www.scopus.com/inward/record.url?scp=84906876867&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000331645900045

U2 - 10.1063/1.4864748

DO - 10.1063/1.4864748

M3 - Article

AN - SCOPUS:84906876867

VL - 115

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 5

M1 - 053711

ER -

ID: 410865