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Influence of surfactants on photoactivation of dielectrics. / Brusnitsyna, L. A.; Kitaev, G. A.
в: Russian Journal of Applied Chemistry, Том 72, № 8, 1999.

Результаты исследований: Вклад в журнал › Статья › Рецензирование

Harvard

Brusnitsyna, LA & Kitaev, GA 1999, 'Influence of surfactants on photoactivation of dielectrics', Russian Journal of Applied Chemistry, Том. 72, № 8.

APA

Brusnitsyna, L. A., & Kitaev, G. A. (1999). Influence of surfactants on photoactivation of dielectrics. Russian Journal of Applied Chemistry, 72(8).

Vancouver

Brusnitsyna LA, Kitaev GA. Influence of surfactants on photoactivation of dielectrics. Russian Journal of Applied Chemistry. 1999;72(8).

Author

Brusnitsyna, L. A. ; Kitaev, G. A. / Influence of surfactants on photoactivation of dielectrics. в: Russian Journal of Applied Chemistry. 1999 ; Том 72, № 8.

BibTeX

@article{6350a5b9752845e79ab1a516568605ce,
title = "Influence of surfactants on photoactivation of dielectrics",
abstract = "Kinetics of copper(II) reduction in a dry photoactivator layer deposited onto a dielectric surface were studied. The rate of photochemical reduction, the amount of photoactivator applied to the dielectric surface, and adhesion of metal coating to the dielectric were determined as influenced by the surfactant nature.",
author = "Brusnitsyna, {L. A.} and Kitaev, {G. A.}",
year = "1999",
language = "English",
volume = "72",
journal = "Russian Journal of Applied Chemistry",
issn = "1070-4272",
publisher = "Pleiades Publishing",
number = "8",

}

RIS

TY - JOUR

T1 - Influence of surfactants on photoactivation of dielectrics

AU - Brusnitsyna, L. A.

AU - Kitaev, G. A.

PY - 1999

Y1 - 1999

N2 - Kinetics of copper(II) reduction in a dry photoactivator layer deposited onto a dielectric surface were studied. The rate of photochemical reduction, the amount of photoactivator applied to the dielectric surface, and adhesion of metal coating to the dielectric were determined as influenced by the surfactant nature.

AB - Kinetics of copper(II) reduction in a dry photoactivator layer deposited onto a dielectric surface were studied. The rate of photochemical reduction, the amount of photoactivator applied to the dielectric surface, and adhesion of metal coating to the dielectric were determined as influenced by the surfactant nature.

UR - http://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=27844548974

M3 - Article

VL - 72

JO - Russian Journal of Applied Chemistry

JF - Russian Journal of Applied Chemistry

SN - 1070-4272

IS - 8

ER -

ID: 56320846