The effect of injection of broad (100 cm 2) low-energy (up to 250 eV) electron beam on characteristics of magnetron sputtering of Al in the Ar/O 2 mixture has been investigated. It was shown that increasing of beam current leads to reduction of the value of O 2 flow rate at which transition to the oxide mode of magnetron sputtering take place as a result of increasing of grow rate of oxide layer on target surface. Al 2O 3 coatings was deposited under 700 °C by reactive magnetron sputtering with ion assistance which adjusted by mean of plasma generation by electron beam. The phase composition of coatings has been investigated by XRD.