The effect of ionization of Ar-N 2 gas mixture by means of low-energy (100 eV) broad (50 cm 2) electron beam on the property of TiN coatings deposited by magnetron sputtering have been investigated. The beam current was regulated in the range 0-8 A. The gas pressure was 0.15-0.28 Pa at the flow rate 1-25 sccm. The TiN coating deposited in absence of electron beam has maximum hardness 25 GPa at nitrogen flow rate 12 sccm. Increasing of beam current leads to growth of nitrogen content in the coating and increasing of hardness up to 30-35 GPa at low value of flow rate of nitrogen. The treatment of beam on gas mixture leads to increasing of the lattice parameter, decreasing of grains size and changing of TiN texture. The application of electron beam in the process of coatings deposition allows varying working parameters in the wide range independently and regulates coating characteristic.