Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review
}
TY - GEN
T1 - Utilization of copper from the process of circuit boards etching by copper-ammonia solution
T2 - book chapter
AU - Skorohodov, V. I.
AU - Anikin, Y. V.
AU - Goriaeva, O. Y.
AU - Putina, N. I.
PY - 2001
Y1 - 2001
N2 - The technology for copper utilization from circuit boards etching is proposed. The technology is based on combination of electrochemical and sorption methods. The conditions of copper electroextraction from ammonia-chloride solutions with obtaining of cathode copper are defined. The stage of electrolysis is destined for copper recuperation from etching process. Due to the electrochemical processes are unacceptable for cathode precipitation of the copper from diluted solutions such as rinse waters, the concentration on the strong-based cationites are used. After filtration throw the sorption columns solution is directed to the stage of circuit boards washing. It allows organizing close loop water recirculation. After saturation, resin is regenerated by chloride ammonium solutions. Obtained eluate directed to the etching stage. Generally, the technology provides copper recuperation and minimize wastes amount.
AB - The technology for copper utilization from circuit boards etching is proposed. The technology is based on combination of electrochemical and sorption methods. The conditions of copper electroextraction from ammonia-chloride solutions with obtaining of cathode copper are defined. The stage of electrolysis is destined for copper recuperation from etching process. Due to the electrochemical processes are unacceptable for cathode precipitation of the copper from diluted solutions such as rinse waters, the concentration on the strong-based cationites are used. After filtration throw the sorption columns solution is directed to the stage of circuit boards washing. It allows organizing close loop water recirculation. After saturation, resin is regenerated by chloride ammonium solutions. Obtained eluate directed to the etching stage. Generally, the technology provides copper recuperation and minimize wastes amount.
UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000167757900054
UR - http://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=0035780605
M3 - Conference contribution
SN - 0-87339-488-7
SP - 715
EP - 725
BT - EPD CONGRESS 2001
A2 - Taylor, P.
PB - Minerals, Metals and Materials Society
ER -
ID: 42986861