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Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode. / Kamenetskikh, A. S.; Gavrilov, N. V.; Surkov, Yu S. et al.
In: Journal of Surface Investigation, Vol. 14, No. 1, 01.01.2020, p. 85-91.

Research output: Contribution to journal › Article › peer-review

Harvard

Kamenetskikh, AS, Gavrilov, NV, Surkov, YS, Tretnikov, PV & Chukin, AV 2020, 'Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode', Journal of Surface Investigation, vol. 14, no. 1, pp. 85-91. https://doi.org/10.1134/S1027451020010061

APA

Kamenetskikh, A. S., Gavrilov, N. V., Surkov, Y. S., Tretnikov, P. V., & Chukin, A. V. (2020). Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode. Journal of Surface Investigation, 14(1), 85-91. https://doi.org/10.1134/S1027451020010061

Vancouver

Kamenetskikh AS, Gavrilov NV, Surkov YS, Tretnikov PV, Chukin AV. Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode. Journal of Surface Investigation. 2020 Jan 1;14(1):85-91. doi: 10.1134/S1027451020010061

Author

Kamenetskikh, A. S. ; Gavrilov, N. V. ; Surkov, Yu S. et al. / Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode. In: Journal of Surface Investigation. 2020 ; Vol. 14, No. 1. pp. 85-91.

BibTeX

@article{87b1863582f0468eb31d6fd7aad9f53b,
title = "Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode",
keywords = "anodic thermal evaporation, high-rate deposition, ion assistance, low-pressure gas discharge, nanocrystalline coatings, XRD, α-AlO, ELECTRON, alpha-Al2O3, CATHODE, PLASMA, FILMS, HARDNESS",
author = "Kamenetskikh, {A. S.} and Gavrilov, {N. V.} and Surkov, {Yu S.} and Tretnikov, {P. V.} and Chukin, {A. V.}",
year = "2020",
month = jan,
day = "1",
doi = "10.1134/S1027451020010061",
language = "English",
volume = "14",
pages = "85--91",
journal = "Journal of Surface Investigation",
issn = "1027-4510",
publisher = "Pleiades Publishing",
number = "1",

}

RIS

TY - JOUR

T1 - Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode

AU - Kamenetskikh, A. S.

AU - Gavrilov, N. V.

AU - Surkov, Yu S.

AU - Tretnikov, P. V.

AU - Chukin, A. V.

PY - 2020/1/1

Y1 - 2020/1/1

KW - anodic thermal evaporation

KW - high-rate deposition

KW - ion assistance

KW - low-pressure gas discharge

KW - nanocrystalline coatings

KW - XRD

KW - α-AlO

KW - ELECTRON

KW - alpha-Al2O3

KW - CATHODE

KW - PLASMA

KW - FILMS

KW - HARDNESS

UR - http://www.scopus.com/inward/record.url?scp=85082309481&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000521161700014

UR - https://www.elibrary.ru/item.asp?id=43259368

U2 - 10.1134/S1027451020010061

DO - 10.1134/S1027451020010061

M3 - Article

AN - SCOPUS:85082309481

VL - 14

SP - 85

EP - 91

JO - Journal of Surface Investigation

JF - Journal of Surface Investigation

SN - 1027-4510

IS - 1

ER -

ID: 12439789