Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode › Research Explorer

Reactive Deposition of Al₂O₃ Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode

Research output: Contribution to journal › Article › peer-review

DOI

https://doi.org/10.1134/S1027451020010061
Final published version

A. S. Kamenetskikh
N. V. Gavrilov
Yu S. Surkov
P. V. Tretnikov
A. V. Chukin

Original language	English
Pages (from-to)	85-91
Number of pages	7
Journal	Journal of Surface Investigation
Volume	14
Issue number	1
DOIs	https://doi.org/10.1134/S1027451020010061
Publication status	Published - 1 Jan 2020

WoS ResearchAreas Categories

Physics, Condensed Matter

Research areas

anodic thermal evaporation, high-rate deposition, ion assistance, low-pressure gas discharge, nanocrystalline coatings, XRD, α-AlO, ELECTRON, alpha-Al2O3, CATHODE, PLASMA, FILMS, HARDNESS

ASJC Scopus subject areas

Surfaces, Coatings and Films

GRNTI

29.00.00 PHYSICS

Level of Research Output

VAK List

ID: 12439789