Neutron Transmutation Doping of Thin Silicon Films Electrodeposited from the KF-KCl-KI-K2SiF6 Melt › Research Explorer

DOI

https://doi.org/10.1149/1945-7111/ab933c
Final published version

Andrey Isakov
Sergey Khvostov
Evgeny Kinev
Michael Laptev
Anastasia Khudorozhkova
Olga Grishenkova
Vladimir Rychkov
Yurii Zaikov

Original language	English
Article number	082515
Number of pages	9
Journal	Journal of the Electrochemical Society
Volume	167
Issue number	8
DOIs	https://doi.org/10.1149/1945-7111/ab933c
Publication status	Published - 25 May 2020

WoS ResearchAreas Categories

Materials Science, Coatings & Films
Electrochemistry

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Materials Chemistry
Surfaces, Coatings and Films
Electrochemistry
Renewable Energy, Sustainability and the Environment

Research areas

Electrodeposition, Films, Neutron transmutation doping, Silicon, Surface modification

ID: 13162102