New optical oxygen-deficient centers in 80 keV Re-implanted amorphous silica

Original language	English
Article number	119775
Number of pages	8
Journal	Journal of Non-Crystalline Solids
Volume	529
DOIs	https://doi.org/10.1016/j.jnoncrysol.2019.119775
Publication status	Published - 1 Feb 2020

Ion implantation, Optical absorption, Oxygen-deficient centers, Photoluminescence, Radiation damage, Silicon dioxide, DEFECTS, PHOTOLUMINESCENCE, LIGHT, NANOCLUSTERS, ULTRAVIOLET, METAL, ABSORPTION, EMISSION, BANDS, SIO2

ID: 11447310