Interfacial reactions in Al2O3/Cr2O3 layers: Electronic structure calculations and X-ray photoelectron spectra › Research Explorer

Interfacial reactions in Al₂O₃/Cr₂O₃ layers: Electronic structure calculations and X-ray photoelectron spectra

Research output: Contribution to journal › Article › peer-review

DOI

https://doi.org/10.1016/j.tsf.2018.08.037
Final published version

Original language	English
Pages (from-to)	6-8
Number of pages	3
Journal	Thin Solid Films
Volume	665
DOIs	https://doi.org/10.1016/j.tsf.2018.08.037
Publication status	Published - 1 Nov 2018

Research areas

Alumina, Chromium oxide, Coherent potential approximation, Density functional theory calculations, Interfacial reactions, X-ray photoelectron spectroscopy, ELEMENTS, CERAMICS

WoS ResearchAreas Categories

Materials Science, Coatings & Films
Materials Science, Multidisciplinary
Physics, Condensed Matter
Physics, Applied

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Metals and Alloys
Materials Chemistry
Surfaces, Coatings and Films
Surfaces and Interfaces

ID: 7889984