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Effect of diffusion on the formation of chemically deposited films of CdS and other chalcogenides. / Skornyakov, L. G.; Uritskaya, A. A.
In: Thin Solid Films, Vol. 735, 138878, 01.10.2021.

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@article{a1a828fdb17b47bc96ac3b4adf1d4456,
title = "Effect of diffusion on the formation of chemically deposited films of CdS and other chalcogenides",
keywords = "Chemical bath deposition, Diffusion, Growth mechanism, Thickness, Thin films, SULFIDE THIN-FILMS, MECHANISM, CADMIUM-SULFIDE, GROWTH-KINETICS, QUARTZ-CRYSTAL MICROBALANCE, BATH DEPOSITION",
author = "Skornyakov, {L. G.} and Uritskaya, {A. A.}",
year = "2021",
month = oct,
day = "1",
doi = "10.1016/j.tsf.2021.138878",
language = "English",
volume = "735",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier BV",

}

RIS

TY - JOUR

T1 - Effect of diffusion on the formation of chemically deposited films of CdS and other chalcogenides

AU - Skornyakov, L. G.

AU - Uritskaya, A. A.

PY - 2021/10/1

Y1 - 2021/10/1

KW - Chemical bath deposition

KW - Diffusion

KW - Growth mechanism

KW - Thickness

KW - Thin films

KW - SULFIDE THIN-FILMS

KW - MECHANISM

KW - CADMIUM-SULFIDE

KW - GROWTH-KINETICS

KW - QUARTZ-CRYSTAL MICROBALANCE

KW - BATH DEPOSITION

UR - http://www.scopus.com/inward/record.url?scp=85113182658&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000704918900003

UR - https://elibrary.ru/item.asp?id=46983532

U2 - 10.1016/j.tsf.2021.138878

DO - 10.1016/j.tsf.2021.138878

M3 - Article

AN - SCOPUS:85113182658

VL - 735

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

M1 - 138878

ER -

ID: 22982172