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Cobalt-Doped Chemically Deposited Lead-Sulfide Films. / Maskaeva, L. N.; Markov, V. F.; Pozdin, A. V. et al.
In: Semiconductors, Vol. 56, No. 2, 2022, p. 91-100.

Research output: Contribution to journal › Article › peer-review

Harvard

Maskaeva, LN, Markov, VF, Pozdin, AV, Mikhaylova , AI, Mostovshchikova, EV, Voronin, VI & Selyanin, IO 2022, 'Cobalt-Doped Chemically Deposited Lead-Sulfide Films', Semiconductors, vol. 56, no. 2, pp. 91-100. https://doi.org/10.1134/S1063782622010122

APA

Maskaeva, L. N., Markov, V. F., Pozdin, A. V., Mikhaylova , A. I., Mostovshchikova, E. V., Voronin, V. I., & Selyanin, I. O. (2022). Cobalt-Doped Chemically Deposited Lead-Sulfide Films. Semiconductors, 56(2), 91-100. https://doi.org/10.1134/S1063782622010122

Vancouver

Maskaeva LN, Markov VF, Pozdin AV, Mikhaylova AI, Mostovshchikova EV, Voronin VI et al. Cobalt-Doped Chemically Deposited Lead-Sulfide Films. Semiconductors. 2022;56(2):91-100. doi: 10.1134/S1063782622010122

Author

Maskaeva, L. N. ; Markov, V. F. ; Pozdin, A. V. et al. / Cobalt-Doped Chemically Deposited Lead-Sulfide Films. In: Semiconductors. 2022 ; Vol. 56, No. 2. pp. 91-100.

BibTeX

@article{0bb783cf50444a51a878e7c32c4f2a83,
title = "Cobalt-Doped Chemically Deposited Lead-Sulfide Films",
keywords = "band gap, chemical deposition, cobalt doping, film morphology, lead sulfide, structural properties, voltage and current photosensitivity",
author = "Maskaeva, {L. N.} and Markov, {V. F.} and Pozdin, {A. V.} and Mikhaylova, {A. I.} and Mostovshchikova, {Elena V.} and Voronin, {Vladimir I.} and Selyanin, {I. O.}",
year = "2022",
doi = "10.1134/S1063782622010122",
language = "English",
volume = "56",
pages = "91--100",
journal = "Semiconductors",
issn = "1063-7826",
publisher = "American Institute of Physics Publising LLC",
number = "2",

}

RIS

TY - JOUR

T1 - Cobalt-Doped Chemically Deposited Lead-Sulfide Films

AU - Maskaeva, L. N.

AU - Markov, V. F.

AU - Pozdin, A. V.

AU - Mikhaylova , A. I.

AU - Mostovshchikova, Elena V.

AU - Voronin, Vladimir I.

AU - Selyanin, I. O.

PY - 2022

Y1 - 2022

KW - band gap

KW - chemical deposition

KW - cobalt doping

KW - film morphology

KW - lead sulfide

KW - structural properties

KW - voltage and current photosensitivity

UR - https://www.elibrary.ru/item.asp?id=48589682

UR - http://www.scopus.com/inward/record.url?scp=85129885913&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000794120800004

U2 - 10.1134/S1063782622010122

DO - 10.1134/S1063782622010122

M3 - Article

VL - 56

SP - 91

EP - 100

JO - Semiconductors

JF - Semiconductors

SN - 1063-7826

IS - 2

ER -

ID: 30391305