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Characterization of TiAlSiON coatings deposited by plasma enhanced magnetron sputtering: XRD, XPS, and DFT studies
Research output
:
Contribution to journal
›
Article
›
peer-review
Institute of Physics and Technology
Department of Electrophysics
Laboratory of Ion Beam and Plasma Technology for New Functional Materials and Coatings
Department of Theoretical Physics and Applied Mathematics
Overview
Cite this
DOI
https://doi.org/10.1016/j.surfcoat.2015.08.007
Final published version
A. S. Kamenetskih
A. I. Kukharenko
E. Z. Kurmaev
N. A. Skorikov
N. V. Gavrilov
S. O. Cholakh
A. V. Chukin
V. M. Zainullina
M. A. Korotin
Original language
English
Pages (from-to)
87-91
Number of pages
5
Journal
Surface and Coatings Technology
Volume
278
DOIs
https://doi.org/10.1016/j.surfcoat.2015.08.007
Publication status
Published -
1 Jan 2015
WoS ResearchAreas Categories
Materials Science, Coatings & Films
Physics, Applied
ASJC Scopus subject areas
Materials Chemistry
Surfaces, Coatings and Films
Surfaces and Interfaces
Condensed Matter Physics
Chemistry(all)
Research areas
TiAlON coatings, Magnetron sputtering, X-ray photoelectron spectra, Density functional theory, Electronic structure, MECHANICAL-PROPERTIES, ION-BOMBARDMENT, SILICON-NITRIDE, THIN-FILMS, TIN FILMS, SI, MICROSTRUCTURE, RESISTANCE
ID: 289406
